Authors:
Feke, GD
Grober, RD
Pohlers, G
Moore, K
Cameron, JF
Citation: Gd. Feke et al., On-wafer spectrofluorometric method for determination of relative quantum yields of photoacid generation in chemically amplified resists, ANALYT CHEM, 73(14), 2001, pp. 3472-3480
Authors:
Feke, GD
Hessman, D
Grober, RD
Lu, B
Taylor, JW
Citation: Gd. Feke et al., On-wafer spectrofluorometric evaluation of the response of photoacid generator compounds in chemically amplified photoresists, J VAC SCI B, 18(1), 2000, pp. 136-139
Citation: Q. Wu et al., Excitons, biexcitons, and electron-hole plasma in a narrow 2.8-nm GaAs/AlxGa1-xAs quantum well, PHYS REV B, 62(19), 2000, pp. 13022-13027