Authors: DECROSTA DA HACKENBERG JJ

Citation: Da. Decrosta et Jj. Hackenberg, CHARGE ISSUES IN HIGH OXYGEN GAS RATIO TETRAETHYLORTHOSILICATE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 709-713

Authors: DECROSTA DA HACKENBERG JJ LINN JH

Citation: Da. Decrosta et al., CHARACTERIZATION OF HIGH OXYGEN - TETRAETHYLORTHOSILICATE RATIO PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITED FILMS, Journal of the Electrochemical Society, 143(3), 1996, pp. 1079-1084

Authors: HACKENBERG JJ DION MJ HEMMENWAY DF PEARCE LG WERNER JW

Citation: Jj. Hackenberg et al., IDENTIFICATION OF PLASMA-INDUCED FAILURE MODES IN THE DEVELOPMENT OF A BIPOLAR-COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 943-947