IDENTIFICATION OF PLASMA-INDUCED FAILURE MODES IN THE DEVELOPMENT OF A BIPOLAR-COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR PROCESS

Authors
HACKENBERG JJ DION MJ HEMMENWAY DF PEARCE LG WERNER JW
Citation
Jj. Hackenberg et al., IDENTIFICATION OF PLASMA-INDUCED FAILURE MODES IN THE DEVELOPMENT OF A BIPOLAR-COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 943-947
Citations number
4
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
3
Year of publication
1995
Part
1
Pages
943 - 947
Database
ISI
SICI code
0734-2101(1995)13:3<943:IOPFMI>2.0.ZU;2-X