Authors: LINDSAY T BARCLAY GG CRONIN MF DELLAGUARDIA R CONLEY W ITO H MORI M HAGERTY P SINTA R ZYDOWSKY T THACKERAY JW

Citation: T. Lindsay et al., A NEW POSITIVE DUV PHOTORESIST OPTIMIZED FOR 0.25-MU-M ISOLATED LINES, Microelectronic engineering, 35(1-4), 1997, pp. 109-112