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Citation: Jr. Markham et al., FT-IR MEASUREMENTS OF EMISSIVITY AND TEMPERATURE DURING HIGH-FLUX SOLAR PROCESSING, Journal of solar energy engineering, 118(1), 1996, pp. 20-29

Authors: KINSELLA K NELSON CM HAIGIS JR CARANGELO MD DITARANTO MB MARKHAM JR

Citation: K. Kinsella et al., HIGH-TEMPERATURE OXYGEN INDEX INSTRUMENT WITH QUANTITATIVE FT-IR GAS-ANALYSIS, Journal of fire sciences, 13(3), 1995, pp. 197-213

Authors: MORRISON PW HAIGIS JR

Citation: Pw. Morrison et Jr. Haigis, INSITU INFRARED MEASUREMENTS OF FILM AND GAS PROPERTIES DURING THE PLASMA DEPOSITION OF AMORPHOUS HYDROGENATED SILICON, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(3), 1993, pp. 490-502