Authors:
MARKHAM JR
SMITH WW
HAIGIS JR
CARANGELO MD
COSGROVE JE
KINSELLA K
SOLOMON PR
BEST PE
LEWANDOWSKI A
BINGHAM CE
PITTS JR
Citation: Jr. Markham et al., FT-IR MEASUREMENTS OF EMISSIVITY AND TEMPERATURE DURING HIGH-FLUX SOLAR PROCESSING, Journal of solar energy engineering, 118(1), 1996, pp. 20-29
Authors:
KINSELLA K
NELSON CM
HAIGIS JR
CARANGELO MD
DITARANTO MB
MARKHAM JR
Citation: K. Kinsella et al., HIGH-TEMPERATURE OXYGEN INDEX INSTRUMENT WITH QUANTITATIVE FT-IR GAS-ANALYSIS, Journal of fire sciences, 13(3), 1995, pp. 197-213
Citation: Pw. Morrison et Jr. Haigis, INSITU INFRARED MEASUREMENTS OF FILM AND GAS PROPERTIES DURING THE PLASMA DEPOSITION OF AMORPHOUS HYDROGENATED SILICON, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(3), 1993, pp. 490-502