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Results: 1-8 |
Results: 8
STATUS AND FUTURE OF X-RAY-LITHOGRAPHY
Authors: HECTOR S
Citation: S. Hector, STATUS AND FUTURE OF X-RAY-LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 25-30
INVESTIGATION OF MASK PATTERN PROXIMITY CORRECTION TO REDUCE IMAGE SHORTENING IN X-RAY-LITHOGRAPHY
Authors: HECTOR S POL V KHAN M BOLLEPALLI S CERRINA F
Citation: S. Hector et al., INVESTIGATION OF MASK PATTERN PROXIMITY CORRECTION TO REDUCE IMAGE SHORTENING IN X-RAY-LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 271-274
X-RAY-LITHOGRAPHY FOR LESS-THAN-OR-EQUAL-TO-100 NM GROUND RULES IN COMPLEX PATTERNS
Authors: HECTOR S POL V KRASNOPEROVA A MALDONADO J FLAMHOLZ A HEALD D STAHLHAMMER C GALBURT D AMODEO R DONOHUE T WIND S BUCHIGNIANO J VISWANATHAN R KHAN M BOLLEPALLI S CERRINA F
Citation: S. Hector et al., X-RAY-LITHOGRAPHY FOR LESS-THAN-OR-EQUAL-TO-100 NM GROUND RULES IN COMPLEX PATTERNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2517-2521
PHOTOINDUCED ELECTRON-TRANSFER REACTIONS OF CHLORANIL WITH SMALL-RINGHYDROCARBONS - CONTRASTING REACTIVITIES OF RADICAL-CATION INTERMEDIATES
Authors: BERGMARK W HECTOR S JONES G OH C KUMAGAI T HARA S SEGAWA T TANAKA N MUKAI T
Citation: W. Bergmark et al., PHOTOINDUCED ELECTRON-TRANSFER REACTIONS OF CHLORANIL WITH SMALL-RINGHYDROCARBONS - CONTRASTING REACTIVITIES OF RADICAL-CATION INTERMEDIATES, Journal of photochemistry and photobiology. A, Chemistry, 109(2), 1997, pp. 119-124
EXTENDIBILITY OF X-RAY-LITHOGRAPHY TO LESS-THAN-OR-EQUAL-TO-130 NM GROUND RULES IN COMPLEX INTEGRATED-CIRCUIT PATTERNS
Authors: HECTOR S CHU W THOMPSON M POL V DAUKSHER B CUMMINGS K RESNICK D PENDHARKAR S MALDONADO J MCCORD M KRASNOPEROVA A LIEBMANN L SILVERMAN J GUO J KHAN M BOLLEPALLI S CAPODIECI L CERRINA F
Citation: S. Hector et al., EXTENDIBILITY OF X-RAY-LITHOGRAPHY TO LESS-THAN-OR-EQUAL-TO-130 NM GROUND RULES IN COMPLEX INTEGRATED-CIRCUIT PATTERNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4288-4293
TRENCH ISOLATION AT 300 NM ACTIVE PITCH USING X-RAY-LITHOGRAPHY
Authors: PERERA AH THOMPSON M HECTOR S IYER S AZRAK MJ ZAVALA M
Citation: Ah. Perera et al., TRENCH ISOLATION AT 300 NM ACTIVE PITCH USING X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4314-4317
X-RAY-INDUCED MASK CONTAMINATION AND PARTICULATE MONITORING IN X-RAY STEPPERS
Authors: CAPASSO C POMERENE A CHU W LEAVEY J LAMBERTI A HECTOR S OBERSCHMIDT J POL V
Citation: C. Capasso et al., X-RAY-INDUCED MASK CONTAMINATION AND PARTICULATE MONITORING IN X-RAY STEPPERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4336-4340
EFFECT OF ABSORBER THICKNESS ON IMAGE SHORTENING IN X-RAY-LITHOGRAPHY
Authors: MALDONADO JR DELLAGUARDIA F HECTOR S MCCORD M LIEBMANN L OERTEL HK
Citation: Jr. Maldonado et al., EFFECT OF ABSORBER THICKNESS ON IMAGE SHORTENING IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3094-3098
Risultati: 1-8 |