X-RAY-INDUCED MASK CONTAMINATION AND PARTICULATE MONITORING IN X-RAY STEPPERS

Authors
CAPASSO C POMERENE A CHU W LEAVEY J LAMBERTI A HECTOR S OBERSCHMIDT J POL V
Citation
C. Capasso et al., X-RAY-INDUCED MASK CONTAMINATION AND PARTICULATE MONITORING IN X-RAY STEPPERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4336-4340
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
14
Issue
6
Year of publication
1996
Pages
4336 - 4340
Database
ISI
SICI code
1071-1023(1996)14:6<4336:XMCAPM>2.0.ZU;2-L
Abstract
The belief that proximity x-ray lithography is insensitive to contamin ation has been based on the assumption that contaminants are small hyd rocarbon compounds. However, we will show that x rays may induce photo assisted processes that deposit saltlike films on the mask surface. We will also provide an explanation for the film geometry in the early s tages of its growth and suggest some possible solutions to the issue. (C) 1996 American Vacuum Society.