Authors: HIFUMI T SUMITANI H ITOGA K WATANABE H INOUE M MARUMOTO K OHSAWA H SAITOH K

Citation: T. Hifumi et al., ANALYSIS OF OVERLAY ACCURACY IN 0.14 MU-M DEVICE FABRICATION USING SYNCHROTRON-RADIATION LITHOGRAPHY, JPN J A P 1, 36(6A), 1997, pp. 3463-3468

Authors: SUMITANI H WATANABE H ITOGA K HIFUMI T SUITA M OGUSHI N MIZUSAWA N UDA K

Citation: H. Sumitani et al., CRITICAL DIMENSION CONTROL IN SYNCHROTRON-RADIATION LITHOGRAPHY USINGA NEGATIVE-TONE CHEMICAL AMPLIFICATION RESIST, JPN J A P 1, 36(12B), 1997, pp. 7591-7596

Authors: SAITOH K OHSAWA H SENTOKU K MATSUMOTO T MIZUSAWA N FUKUDA Y UDA K SUMITANI H HIFUMI T

Citation: K. Saitoh et al., OVERLAY ACCURACY OF CANON SYNCHROTRON-RADIATION STEPPER XFPA FOR 0.15-MU-M PROCESS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4303-4307

Authors: KISE K AYA S YABE H MARUMOTO K HIFUMI T MATSUI Y

Citation: K. Kise et al., ELECTRON-BEAM WRITING TECHNIQUES FOR FABRICATING HIGHLY ACCURATE X-RAY MASKS, JPN J A P 1, 34(12B), 1995, pp. 6738-6742

Authors: HIFUMI T

Citation: T. Hifumi, AN EXAMINATION OF INTERNAL CONVERSATION P ROCESS BETWEEN NATIVE SPEAKER NONNATIVE SPEAKER, Kyoiku shinrigaku kenkyu, 43(3), 1995, pp. 277-286