Authors:
MURTAGH M
LYNCH SM
KELLY PV
HILDEBRANT S
HERBERT PAF
JEYNES C
CREAN GM
Citation: M. Murtagh et al., PHOTOREFLECTANCE CHARACTERIZATION OF AR+ ION ETCHED AND SICL4 REACTIVE ION ETCHED SILICON(100), Materials science and technology, 13(11), 1997, pp. 961-964