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Results: 1-18 |
Results: 18
INVESTIGATION OF POSTOXIDATION THERMAL TREATMENTS OF SI SIO2 INTERFACE IN RELATIONSHIP TO THE KINETICS OF AMORPHOUS SI SUBOXIDE DECOMPOSITION/
Authors: HINDS BJ WANG F WOLFE DM HINKLE CL LUCOVSKY G
Citation: Bj. Hinds et al., INVESTIGATION OF POSTOXIDATION THERMAL TREATMENTS OF SI SIO2 INTERFACE IN RELATIONSHIP TO THE KINETICS OF AMORPHOUS SI SUBOXIDE DECOMPOSITION/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2171-2176
STUDY OF SIOX DECOMPOSITION KINETICS AND FORMATION OF SI NANOCRYSTALSIN AN SIOX MATRIX
Authors: HINDS BJ WANG F WOLFE DM HINKLE CL LUCOVSKY G
Citation: Bj. Hinds et al., STUDY OF SIOX DECOMPOSITION KINETICS AND FORMATION OF SI NANOCRYSTALSIN AN SIOX MATRIX, Journal of non-crystalline solids, 230, 1998, pp. 507-512
NEW MATERIALS FOR SUPERCONDUCTING ELECTRONICS - EPITAXIAL-GROWTH OF LASRGAO4 AND PRSRGAO4 DIELECTRIC THIN-FILMS BY MOCVD
Authors: BELOT JA HINDS BJ CHEN J WANG YY DRAVID V MARKS TJ
Citation: Ja. Belot et al., NEW MATERIALS FOR SUPERCONDUCTING ELECTRONICS - EPITAXIAL-GROWTH OF LASRGAO4 AND PRSRGAO4 DIELECTRIC THIN-FILMS BY MOCVD, CHEMICAL VAPOR DEPOSITION, 3(2), 1997, pp. 78
MOCVD ROUTES TO TL-2212 MGO/TL-2212 TRILAYERS - PRELIMINARY-OBSERVATIONS ON GROWTH AND MICROSTRUCTURAL/ELECTRICAL PROPERTIES/
Authors: HINDS BJ MCNEELY RJ CHEN J DIAS C STUDEBAKER DL MARKS TJ HOGAN TP SCHINDLER JL KANNEWURF CR
Citation: Bj. Hinds et al., MOCVD ROUTES TO TL-2212 MGO/TL-2212 TRILAYERS - PRELIMINARY-OBSERVATIONS ON GROWTH AND MICROSTRUCTURAL/ELECTRICAL PROPERTIES/, Journal of alloys and compounds, 251(1-2), 1997, pp. 328-331
CHARACTERISTIC DOPING-DEPENDENT PROPERTIES OF HTS CUPRATE THIN-FILMS PREPARED VIA MOCVD
Authors: SCHINDLER JL DURAN CR DIMEO F WESSELS BW HINDS BJ MCNEELY RJ MARKS TJ KANNEWURF CR
Citation: Jl. Schindler et al., CHARACTERISTIC DOPING-DEPENDENT PROPERTIES OF HTS CUPRATE THIN-FILMS PREPARED VIA MOCVD, Journal of alloys and compounds, 251(1-2), 1997, pp. 347-350
NEW STRUCTURAL ASPECTS OF TL2BA2CACU2OY EPITAXIAL THIN-FILMS GROWN BYMOCVD ON LAALO3
Authors: ZHANG XF SUNG YS MILLER DJ HINDS BJ MCNEELY RJ STUDEBAKER DL MARKS TJ
Citation: Xf. Zhang et al., NEW STRUCTURAL ASPECTS OF TL2BA2CACU2OY EPITAXIAL THIN-FILMS GROWN BYMOCVD ON LAALO3, Physica. C, Superconductivity, 275(1-2), 1997, pp. 146-154
VOLATILITY BY DESIGN - SYNTHESIS AND CHARACTERIZATION OF POLYETHER ADDUCTS OF S(1,1,1,5,5,5-HEXAFLUORO-2,4-PENTANEDIONATO)BARIUM AND THEIR IMPLEMENTATION AS METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION PRECURSORS
Authors: BELOT JA NEUMAYER DA REEDY CJ STUDEBAKER DB HINDS BJ STERN CL MARKS TJ
Citation: Ja. Belot et al., VOLATILITY BY DESIGN - SYNTHESIS AND CHARACTERIZATION OF POLYETHER ADDUCTS OF S(1,1,1,5,5,5-HEXAFLUORO-2,4-PENTANEDIONATO)BARIUM AND THEIR IMPLEMENTATION AS METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION PRECURSORS, Chemistry of materials, 9(7), 1997, pp. 1638-1648
THIN-FILMS FOR SUPERCONDUCTING ELECTRONICS - PRECURSOR PERFORMANCE ISSUES, DEPOSITION MECHANISMS, AND SUPERCONDUCTING PHASE FORMATION-PROCESSING STRATEGIES IN THE GROWTH OF TL2BA2CACU2O8 FILMS BY METAL-ORGANICCHEMICAL-VAPOR-DEPOSITION
Authors: HINDS BJ MCNEELY RJ STUDEBAKER DB MARKS TJ HOGAN TP SCHINDLER JL KANNEWURF CR ZHANG XF MILLER DJ
Citation: Bj. Hinds et al., THIN-FILMS FOR SUPERCONDUCTING ELECTRONICS - PRECURSOR PERFORMANCE ISSUES, DEPOSITION MECHANISMS, AND SUPERCONDUCTING PHASE FORMATION-PROCESSING STRATEGIES IN THE GROWTH OF TL2BA2CACU2O8 FILMS BY METAL-ORGANICCHEMICAL-VAPOR-DEPOSITION, Journal of materials research, 12(5), 1997, pp. 1214-1236
EFFICIENT ROUTE TO TLBA2CA2CU3O9-FILMS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION USING TLF AS A THALLINATION SOURCE(X THIN)
Authors: MCNEELY RJ BELOT JA HINDS BJ MARKS TJ SCHINDLER JL CHUDZIK MP KANNEWURF CR ZHANG XF MILLER DJ
Citation: Rj. Mcneely et al., EFFICIENT ROUTE TO TLBA2CA2CU3O9-FILMS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION USING TLF AS A THALLINATION SOURCE(X THIN), Applied physics letters, 71(9), 1997, pp. 1243-1245
NEW APPROACH TO PREPARING SMOOTH SI(100) SURFACES - CHARACTERIZATION BY SPECTROELLIPSOMETRY AND VALIDATION OF SI SIO2 INTERFACES PROPERTIESIN METAL-OXIDE-SEMICONDUCTOR DEVICES/
Authors: SCHMIDT D NIIMI H HINDS BJ ASPNES DE LUCOVSKY G
Citation: D. Schmidt et al., NEW APPROACH TO PREPARING SMOOTH SI(100) SURFACES - CHARACTERIZATION BY SPECTROELLIPSOMETRY AND VALIDATION OF SI SIO2 INTERFACES PROPERTIESIN METAL-OXIDE-SEMICONDUCTOR DEVICES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2812-2816
MOCVD ROUTES TO TL(2)BA(2)CA(N-1)CU(N)O(4-FILMS(2N)SUPERCONDUCTOR ANDDIELECTRIC INSULATOR THIN)
Authors: HINDS BJ STUDEBAKER DB CHEN J MCNEELY RJ HAN B SCHINDLER JL HOGAN TP KANNEWURF CR MARKS TJ
Citation: Bj. Hinds et al., MOCVD ROUTES TO TL(2)BA(2)CA(N-1)CU(N)O(4-FILMS(2N)SUPERCONDUCTOR ANDDIELECTRIC INSULATOR THIN), Journal de physique. IV, 5(C5), 1995, pp. 391-406
MOCVD ROUTES TO TL2BA2CAN-1CUNO4-FILMS(2N SUPERCONDUCTOR AND DIELECTRIC INSULATOR THIN)
Authors: HINDS BJ STUDEBAKER DB CHEN J MCNEELY RJ HAN B SCHINDLER JL HOGAN TP KANNEWURF CR MARKS TJ
Citation: Bj. Hinds et al., MOCVD ROUTES TO TL2BA2CAN-1CUNO4-FILMS(2N SUPERCONDUCTOR AND DIELECTRIC INSULATOR THIN), Journal de physique. IV, 5(C5), 1995, pp. 391-406
SYNTHESIS, CHARACTERIZATION AND CRYSTAL-STRUCTURE OF A NEW THERMALLY STABLE AND VOLATILE PRECURSOR CAFLUORONONANE-4,6-DIONATO)2-TETRAGLYME]BARIUM(II) FOR MOCVD APPLICATION
Authors: MALANDRINO G FRAGALA IL NEUMAYER DA STERN CL HINDS BJ MARKS TJ
Citation: G. Malandrino et al., SYNTHESIS, CHARACTERIZATION AND CRYSTAL-STRUCTURE OF A NEW THERMALLY STABLE AND VOLATILE PRECURSOR CAFLUORONONANE-4,6-DIONATO)2-TETRAGLYME]BARIUM(II) FOR MOCVD APPLICATION, Journal of materials chemistry, 4(7), 1994, pp. 1061-1066
NEW PRECURSORS FOR BARIUM METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION - IN-SITU GROWTH OF EPITAXIAL BARIUM-TITANATE FILM USING A LIQUID BARIUM PRECURSOR
Authors: NEUMAYER DA STUDEBAKER DB HINDS BJ STERN CL MARKS TJ
Citation: Da. Neumayer et al., NEW PRECURSORS FOR BARIUM METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION - IN-SITU GROWTH OF EPITAXIAL BARIUM-TITANATE FILM USING A LIQUID BARIUM PRECURSOR, Chemistry of materials, 6(7), 1994, pp. 878-880
METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION OPEN FLOW THALLIUM ANNEALING ROUTE TO EPITAXIAL TL2BA2CA2CU3O10 THIN-FILMS
Authors: HINDS BJ SCHULZ DL NEUMAYER DA HAN B MARKS TJ WANG YY DRAVID VP SCHINDLER JL HOGAN TP KANNEWURF CR
Citation: Bj. Hinds et al., METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION OPEN FLOW THALLIUM ANNEALING ROUTE TO EPITAXIAL TL2BA2CA2CU3O10 THIN-FILMS, Applied physics letters, 65(2), 1994, pp. 231-233
TRANSMISSION ELECTRON-MICROSCOPIC CHARACTERIZATION OF METAL-ORGANIC CHEMICAL-VAPOR DEPOSITION-DERIVED SUPERCONDUCTING TL2BA2CA1CU2OX THIN-FILMS ON AU-SUBSTRATES - EVIDENCE FOR AU-CU ALLOY FORMATION AND TEXTURING ON A NONPLANAR METAL-SUBSTRATE
Authors: HU JG MILLER DJ SCHULZ DL HAN B NEUMAYER DA HINDS BJ MARKS TJ
Citation: Jg. Hu et al., TRANSMISSION ELECTRON-MICROSCOPIC CHARACTERIZATION OF METAL-ORGANIC CHEMICAL-VAPOR DEPOSITION-DERIVED SUPERCONDUCTING TL2BA2CA1CU2OX THIN-FILMS ON AU-SUBSTRATES - EVIDENCE FOR AU-CU ALLOY FORMATION AND TEXTURING ON A NONPLANAR METAL-SUBSTRATE, Physica. C, Superconductivity, 210(1-2), 1993, pp. 97-105
BARIUM BETA-KETOIMINATE COMPLEXES CONTAINING APPENDED ETHER LARIATS -SYNTHESIS, CHARACTERIZATION, AND IMPLEMENTATION AS FLUORINE-FREE BARIUM MOCVD PRECURSORS
Authors: SCHULZ DL HINDS BJ NEUMAYER DA STERN CL MARKS TJ
Citation: Dl. Schulz et al., BARIUM BETA-KETOIMINATE COMPLEXES CONTAINING APPENDED ETHER LARIATS -SYNTHESIS, CHARACTERIZATION, AND IMPLEMENTATION AS FLUORINE-FREE BARIUM MOCVD PRECURSORS, Chemistry of materials, 5(11), 1993, pp. 1605-1617
CRACK DEVELOPMENT IN A CARBON-CARBON LAMINATE
Authors: POLLOCK PB HINDS BJ TEDERS RJ KOCHER CG
Citation: Pb. Pollock et al., CRACK DEVELOPMENT IN A CARBON-CARBON LAMINATE, Carbon, 31(6), 1993, pp. 992-996
Risultati: 1-18 |