Authors: ZYWITZKI O HOETZSCH G

Citation: O. Zywitzki et G. Hoetzsch, CORRELATION BETWEEN STRUCTURE AND PROPERTIES OF REACTIVELY DEPOSITED AL2O3 COATINGS BY PULSED MAGNETRON SPUTTERING, Surface & coatings technology, 94-5(1-3), 1997, pp. 303-308

Authors: METZNER C GOEDICKE K HOETZSCH G SCHEFFEL B HEINSS JP

Citation: C. Metzner et al., ELECTRON BEAM-PVD ENHANCED SURFACE-PROPERTIES ON METALLIC STRIPS AND SHEETS, Surface & coatings technology, 94-5(1-3), 1997, pp. 663-668

Authors: ZYWITZKI O HOETZSCH G

Citation: O. Zywitzki et G. Hoetzsch, INFLUENCE OF COATING PARAMETERS ON THE STRUCTURE AND PROPERTIES OF AL2O3 LAYERS REACTIVELY DEPOSITED BY MEANS OF PULSED MAGNETRON SPUTTERING, Surface & coatings technology, 86-7(1-3), 1996, pp. 640-647

Authors: ZYWITZKI O HOETZSCH G FIETZKE F GOEDICKE K

Citation: O. Zywitzki et al., EFFECT OF THE SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF AL2O3 LAYERS REACTIVELY DEPOSITED BY PULSED MAGNETRON SPUTTERING, Surface & coatings technology, 82(1-2), 1996, pp. 169-175

Authors: ZYWITZKI O HOETZSCH G

Citation: O. Zywitzki et G. Hoetzsch, EFFECT OF PLASMA ACTIVATION ON THE PHASE-TRANSFORMATIONS OF ALUMINUM-OXIDE, Surface & coatings technology, 77(1-3), 1995, pp. 754-762

Authors: SCHILLER S HOETZSCH G NEUMANN M MORGNER H ZYWITZKI O

Citation: S. Schiller et al., PLASMA-ACTIVATED HIGH-RATE EVAPORATION USING A LOW-VOLTAGE ELECTRON-BEAM SYSTEM, Surface & coatings technology, 68, 1994, pp. 788-793