Authors:
FALCIGNO P
MUNZEL N
HOLZWARTH H
SCHACHT HT
MERTESDORF C
BRONNER W
KAUFEL G
TIMKO A
NALAMASU O
Citation: P. Falcigno et al., LITHOGRAPHIC AND PATTERN TRANSFER OF A NOVEL DEEP-UV PHOTORESIST - ARCH2, Microelectronic engineering, 30(1-4), 1996, pp. 279-282
Authors:
NALAMASU O
REICHMANIS E
TIMKO AG
TARASCON R
NOVEMBRE AE
SLATER S
HOLZWARTH H
FALCIGNO P
MUNZEL N
Citation: O. Nalamasu et al., A UNIFIED APPROACH TO RESIST MATERIALS DESIGN FOR THE ADVANCED LITHOGRAPHIC TECHNOLOGIES, Microelectronic engineering, 27(1-4), 1995, pp. 367-370