Citation: St. Hsia et al., EVALUATION OF NI-IN-NI MULTILAYERS FOR THERMALLY STABLE OHMIC CONTACTS TO N-GAAS, Materials science & engineering. B, Solid-state materials for advanced technology, 33(2-3), 1995, pp. 178-181
Citation: Lj. Chen et al., THE ANISOTROPIC PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SIO2 SPIN-ON GLASS PROCESS FOR 0.35 MU-M TECHNOLOGY/, JPN J A P 1, 32(12B), 1993, pp. 6119-6121