Authors: JUNG KB LAMBERS ES CHILDRESS JR PEARTON SJ JENSON M HURST AT

Citation: Kb. Jung et al., DEVELOPMENT OF ELECTRON-CYCLOTRON-RESONANCE AND INDUCTIVELY-COUPLED PLASMA HIGH-DENSITY PLASMA-ETCHING FOR PATTERNING OF NIFE AND NIFECO, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1697-1701

Authors: JUNG KB HONG J CHO H CHILDRESS JR PEARTON SJ JENSON M HURST AT

Citation: Kb. Jung et al., PLASMA CHEMISTRIES FOR DRY-ETCHING OF NIFE AND NIFECO, Journal of electronic materials, 27(8), 1998, pp. 972-978

Authors: JUNG KB LAMBERS ES CHILDRESS JR PEARTON SJ JENSON M HURST AT

Citation: Kb. Jung et al., CL-2-BASED INDUCTIVELY-COUPLED PLASMA-ETCHING OF NIFE AND RELATED MATERIALS, Journal of the Electrochemical Society, 145(11), 1998, pp. 4025-4028

Authors: JUNG KB LEE JW PARK YD CHILDRESS JR PEARTON SJ JENSON M HURST AT

Citation: Kb. Jung et al., ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING OF MATERIALS FOR MAGNETO-RESISTIVE RANDOM-ACCESS MEMORY APPLICATIONS, Journal of electronic materials, 26(11), 1997, pp. 1310-1313

Authors: JUNG KB LAMBERS ES CHILDRESS JR PEARTON SJ JENSON M HURST AT

Citation: Kb. Jung et al., HIGH-RATE DRY-ETCHING OF NI0.8FE0.2 AND NIFECO, Applied physics letters, 71(9), 1997, pp. 1255-1257