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Results: 1-8 |
Results: 8
Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy
Authors: Kleineberg, U Haindl, G Hutten, A Reiss, G Gullikson, EM Jones, MS Mrowka, S Rekawa, SB Underwood, JH
Citation: U. Kleineberg et al., Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy, APPL PHYS A, 73(4), 2001, pp. 515-519
Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
Authors: Lim, YC Westermalbesloh, T Aschentrup, A Wehmeyer, O Haindl, G Kleineberg, U Heinzmann, U
Citation: Yc. Lim et al., Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth, APPL PHYS A, 72(1), 2001, pp. 121-124
Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers - X-ray comparative study
Authors: Anopchenko, A Jergel, M Majkova, E Luby, S Holy, V Aschentrup, A Kolina, I Lim, YC Haindl, G Kleineberg, U Heinzmann, U
Citation: A. Anopchenko et al., Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers - X-ray comparative study, PHYSICA B, 305(1), 2001, pp. 14-20
Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining
Authors: Barth, W Debski, T Shi, F Hudek, P Kostic, I Rangelow, IW Biehl, S Iwert, T Grabiec, P Studzinska, K Mitura, S Bekh, II Lushkin, AE Il'chenko, LG Il'chenko, VV Haindl, G
Citation: W. Barth et al., Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining, J VAC SCI B, 18(6), 2000, pp. 3544-3548
Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films
Authors: Klipp, A Hamelmann, F Haindl, G Hartwich, J Kleineberg, U Jutzi, P Heinzmann, U
Citation: A. Klipp et al., Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films, CHEM VAPOR, 6(2), 2000, pp. 63
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
Authors: Dreeskornfeld, L Segler, R Haindl, G Wehmeyer, O Rahn, S Majkova, E Kleineberg, U Heinzmann, U Hudek, P Kostic, I
Citation: L. Dreeskornfeld et al., Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy, MICROEL ENG, 54(3-4), 2000, pp. 303-314
Metal oxide/silicon oxide multilayer with smooth interfaces produced by insitu controlled plasma-enhanced MOCVD
Authors: Hamelmann, F Haindl, G Schmalhorst, J Aschentrup, A Majkova, E Kleineberg, U Heinzmann, U Klipp, A Jutzi, P Anopchenko, A Jergel, M Luby, S
Citation: F. Hamelmann et al., Metal oxide/silicon oxide multilayer with smooth interfaces produced by insitu controlled plasma-enhanced MOCVD, THIN SOL FI, 358(1-2), 2000, pp. 90-93
W/Si multilayers deposited by hot-filament MOCVD
Authors: Hamelmann, F Petri, SHA Klipp, A Haindl, G Hartwich, J Dreeskornfeld, L Kleineberg, U Jutzi, P Heinzmann, U
Citation: F. Hamelmann et al., W/Si multilayers deposited by hot-filament MOCVD, THIN SOL FI, 338(1-2), 1999, pp. 70-74
Risultati: 1-8 |