Authors: Woodworth, JR Riley, ME Arnatucci, VA Hamilton, TW Aragon, BP

Citation: Jr. Woodworth et al., Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges, J VAC SCI A, 19(1), 2001, pp. 45-55

Authors: Hebner, GA Blain, MG Hamilton, TW Nichols, CA Jarecki, RL

Citation: Ga. Hebner et al., Surface dependent electron and negative ion density in inductively coupleddischarges, J VAC SCI A, 17(6), 1999, pp. 3172-3178

Authors: Woodworth, JR Blain, MG Jarecki, RL Hamilton, TW Aragon, BP

Citation: Jr. Woodworth et al., Absolute intensities of the vacuum ultraviolet spectra in a metal-etch plasma processing discharge, J VAC SCI A, 17(6), 1999, pp. 3209-3217

Authors: Hebner, GA Blain, MG Hamilton, TW

Citation: Ga. Hebner et al., Influence of surface material on the boron chloride density in inductivelycoupled discharges, J VAC SCI A, 17(6), 1999, pp. 3218-3224