Authors: Koester, SJ Rim, K Chu, JO Mooney, PM Ott, JA Hargrove, MA

Citation: Sj. Koester et al., Effect of thermal processing on strain relaxation and interdiffusion in Si/SiGe heterostructures studied using Raman spectroscopy, APPL PHYS L, 79(14), 2001, pp. 2148-2150