Authors: Volland, BE Heerlein, H Kostic, I Rangelow, IW

Citation: Be. Volland et al., The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS, MICROEL ENG, 57-8, 2001, pp. 641-650

Authors: Barth, W Debski, T Abedinov, N Ivanov, T Heerlein, H Volland, B Gotszalk, T Rangelow, IW Torkar, K Fritzenwallner, K Grabiec, P Studzinska, K Kostic, I Hudek, P

Citation: W. Barth et al., Evaluation and fabrication of AFM array for ESA-Midas /Rosetta space mission, MICROEL ENG, 57-8, 2001, pp. 825-831

Authors: Volland, B Shi, F Heerlein, H Rangelow, IW Hudek, P Kostic, I Cekan, E Vonach, H Loeschner, H Horner, C Stengl, G Buschbeck, H Zeininger, M Bleeker, A Benschop, J

Citation: B. Volland et al., Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment, J VAC SCI B, 18(6), 2000, pp. 3202-3206

Authors: Volland, B Hudek, FS Heerlein, H Rangelow, IW

Citation: B. Volland et al., Dry etching with gas chopping without rippled sidewalls, J VAC SCI B, 17(6), 1999, pp. 2768-2771

Authors: de Jager, PWH Derksen, G Mertens, B Cekan, E Lammer, G Vonach, H Buschbeck, H Zeininger, M Horner, C Loschner, H Stengl, G Bleeker, AJ Benschop, J Shi, F Volland, B Hudek, P Heerlein, H Rangelow, IW Kaesmaier, R

Citation: Pwh. De Jager et al., Experimental results of the stochastic Coulomb interaction in ion projection lithography, J VAC SCI B, 17(6), 1999, pp. 3098-3106