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Citation: A. Heesemann et al., Does the diffusion mechanism in thin amorphous Co81Zr19 films change during structural relaxation?, NEW J PHYS, 3, 2001, pp. 61-67

Authors: Heesemann, A Ratzke, K Zollmer, V Faupel, F

Citation: A. Heesemann et al., Concentration dependence of Co diffusion in CoxZr1-x glasses, Z METALLKUN, 91(11), 2000, pp. 909-912

Authors: Heesemann, A Zollmer, V Ratzke, K Faupel, F

Citation: A. Heesemann et al., Evidence of highly collective Co diffusion in the whole stability range ofCo-Zr glasses, PHYS REV L, 84(7), 2000, pp. 1467-1470

Authors: Heesemann, A Schmidtke, E Faupel, F Kolb-Telieps, A Klower, J

Citation: A. Heesemann et al., Aluminum and silicon diffusion in Fe-Cr-Al alloys, SCR MATER, 40(5), 1999, pp. 517-522