Authors: Current, MI Liu, W Roth, IS Lamm, AJ En, WG Malik, IJ Feng, L Bryan, MA Qin, S Henley, FJ Chan, C Cheung, NW

Citation: Mi. Current et al., A plasma immersion implantation system for materials modification, SURF COAT, 136(1-3), 2001, pp. 138-141

Authors: Current, MI Bedell, SW Malik, IJ Feng, LM Henley, FJ

Citation: Mi. Current et al., What is the future of sub-100nm CMOS: Ultrashallow junctions or ultrathin SOI?, SOL ST TECH, 43(9), 2000, pp. 66