Authors:
Vos, R
Lux, M
Xu, K
Fyen, W
Kenens, C
Conard, T
Mertens, P
Heyns, M
Hatcher, Z
Hoffman, M
Citation: R. Vos et al., Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures, J ELCHEM SO, 148(12), 2001, pp. G683-G691
Authors:
De Smedt, F
Vinckier, C
Cornelissen, I
De Gendt, S
Heyns, M
Citation: F. De Smedt et al., A detailed study on the growth of thin oxide layers on silicon using ozonated solutions, J ELCHEM SO, 147(3), 2000, pp. 1124-1129
Authors:
Bearda, T
Houssa, M
Mertens, PW
Vanhellemont, J
Heyns, M
Citation: T. Bearda et al., Observation of critical gate oxide thickness for substrate-defect related oxide failure, APPL PHYS L, 75(9), 1999, pp. 1255-1257