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Results: 1-10 |
Results: 10
Pattern characterization of deep-ultraviolet photoresists by near-field infrared microscopy
Authors: Dragnea, B Preusser, J Szarko, JM Leone, SR Hinsberg, WD
Citation: B. Dragnea et al., Pattern characterization of deep-ultraviolet photoresists by near-field infrared microscopy, J VAC SCI B, 19(1), 2001, pp. 142-152
Chemical mapping of patterned polymer photoresists by near-field infrared microscopy
Authors: Dragnea, B Preusser, J Szarko, JM McDonough, LA Leone, SR Hinsberg, WD
Citation: B. Dragnea et al., Chemical mapping of patterned polymer photoresists by near-field infrared microscopy, APPL SURF S, 175, 2001, pp. 783-789
Chemical and physical aspects of the post-exposure baking process used forpositive-tone chemically amplified resists
Authors: Hinsberg, WD Houle, FA Sanchez, MI Wallraff, GM
Citation: Wd. Hinsberg et al., Chemical and physical aspects of the post-exposure baking process used forpositive-tone chemically amplified resists, IBM J RES, 45(5), 2001, pp. 667-682
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
Authors: Houle, FA Hinsberg, WD Morrison, M Sanchez, MI Wallraff, G Larson, C Hoffnagle, J
Citation: Fa. Houle et al., Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist, J VAC SCI B, 18(4), 2000, pp. 1874-1885
Silyl-protected hydroxystyrenes: Living anionic polymerization at room temperature and selective desilylation
Authors: Ito, H Knebelkamp, A Lundmark, SB Nguyen, CV Hinsberg, WD
Citation: H. Ito et al., Silyl-protected hydroxystyrenes: Living anionic polymerization at room temperature and selective desilylation, J POL SC PC, 38(13), 2000, pp. 2415-2427
Manipulation of surface properties by patterning of covalently bound polymer brushes
Authors: Husemann, M Morrison, M Benoit, D Frommer, KJ Mate, CM Hinsberg, WD Hedrick, JL Hawker, CJ
Citation: M. Husemann et al., Manipulation of surface properties by patterning of covalently bound polymer brushes, J AM CHEM S, 122(8), 2000, pp. 1844-1845
Liquid immersion deep-ultraviolet interferometric lithography
Authors: Hoffnagle, JA Hinsberg, WD Sanchez, M Houle, FA
Citation: Ja. Hoffnagle et al., Liquid immersion deep-ultraviolet interferometric lithography, J VAC SCI B, 17(6), 1999, pp. 3306-3309
Mechanism of phenolic polymer dissolution: Importance of acid-base equilibria
Authors: Flanagin, LW McAdams, CL Hinsberg, WD Sanchez, IC Willson, CG
Citation: Lw. Flanagin et al., Mechanism of phenolic polymer dissolution: Importance of acid-base equilibria, MACROMOLEC, 32(16), 1999, pp. 5337-5343
Transmission near-field scanning microscope for infrared chemical imaging
Authors: Dragnea, B Preusser, J Schade, W Leone, SR Hinsberg, WD
Citation: B. Dragnea et al., Transmission near-field scanning microscope for infrared chemical imaging, J APPL PHYS, 86(5), 1999, pp. 2795-2799
Lithographic imaging techniques for the formation of nanoscopic features
Authors: Wallraff, GM Hinsberg, WD
Citation: Gm. Wallraff et Wd. Hinsberg, Lithographic imaging techniques for the formation of nanoscopic features, CHEM REV, 99(7), 1999, pp. 1801-1821
Risultati: 1-10 |