Authors: Klein, TM Niu, D Epling, WS Li, W Maher, DM Hobbs, CC Hegde, RI Baumvol, IJR Parsons, GN

Citation: Tm. Klein et al., Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100), APPL PHYS L, 75(25), 1999, pp. 4001-4003