Authors:
Houle, FA
Hinsberg, WD
Morrison, M
Sanchez, MI
Wallraff, G
Larson, C
Hoffnagle, J
Citation: Fa. Houle et al., Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist, J VAC SCI B, 18(4), 2000, pp. 1874-1885
Authors:
Hinsberg, W
Houle, FA
Hoffnagle, J
Sanchez, M
Wallraff, G
Morrison, M
Frank, S
Citation: W. Hinsberg et al., Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance, J VAC SCI B, 16(6), 1998, pp. 3689-3694