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Liu, WK
Stewart, TR
Cornfeld, AB
Fang, XM
Xu, X
Specht, P
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Goorsky, MS
Whelan, CS
Hoke, WE
Marsh, PF
Millunchick, JM
Svensson, SP
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Authors:
Hoke, WE
Lemonias, PJ
Kennedy, TD
Torabi, A
Tong, EK
Chang, KL
Hsieh, KC
Citation: We. Hoke et al., Molecular beam epitaxial growth and characterization of strain-compensatedAl0.3In0.7P/InP/Al0.3In0.7P metamorphic-pseudomorphic high electron mobility transistors on GaAs substrates, J VAC SCI B, 19(4), 2001, pp. 1519-1523
Authors:
Jang, JH
Cueva, G
Dumka, DC
Hoke, WE
Lemonias, PJ
Fay, P
Adesida, I
Citation: Jh. Jang et al., The impact of a large bandgap drift region in long-wavelength metamorphic photodiodes, IEEE PHOTON, 13(10), 2001, pp. 1097-1099
Authors:
Dumka, DC
Hoke, WE
Lemonias, PJ
Cueva, G
Adesida, I
Citation: Dc. Dumka et al., High performance 0.35 mu m gate-length monolithic enhancement/depletion-mode metamorphic In0.52Al0.48As/In0.53Ga0.47As HEMTs on GaAs substrates, IEEE ELEC D, 22(8), 2001, pp. 364-366
Authors:
Jang, JH
Cueva, G
Dumka, DC
Hoke, WE
Lemonias, PJ
Fay, P
Adesida, I
Citation: Jh. Jang et al., Long wavelength metamorphic double heterojunction In0.53Ga0.47As/InAlGaAs/In0.52Al0.48As photodiodes on GaAs substrates, ELECTR LETT, 37(11), 2001, pp. 707-708
Authors:
Hoke, WE
Lyman, PS
Whelan, CS
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Torabi, A
Chang, KL
Hsieh, KC
Citation: We. Hoke et al., Growth and characterization of metamorphic In-x(AlGa)(1-x)As/InxGa1-xAs high electron mobility transistor material and devices with X=0.3-0.4, J VAC SCI B, 18(3), 2000, pp. 1638-1641
Authors:
Whelan, CS
Marsh, PF
Hoke, WE
McTaggart, RA
Lyman, PS
Lemonias, PJ
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Leoni, RE
Lichwala, SJ
Kazior, TE
Citation: Cs. Whelan et al., Millimeter-wave low-noise and high-power metamorphic HEMT amplifiers and devices on GaAs substrates, IEEE J SOLI, 35(9), 2000, pp. 1307-1311
Authors:
Dumka, DC
Hoke, WE
Lemonias, PJ
Cueva, G
Adesida, I
Citation: Dc. Dumka et al., Metamorphic In0.52Al0.48As/In0.53Ga0.47As HEMTs on GaAs substrate with f(T) over 200 GHz, ELECTR LETT, 35(21), 1999, pp. 1854-1856
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