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Gunzel, R
Hornauer, U
Rogozin, AI
Astrelin, VT
Citation: R. Gunzel et al., Basic investigations of an integrated modulator for plasma immersion ion implantation, SURF COAT, 136(1-3), 2001, pp. 47-50
Authors:
Hornauer, U
Richter, E
Matz, W
Reuther, H
Mucklich, A
Wieser, E
Moller, W
Schumacher, G
Schutze, M
Citation: U. Hornauer et al., Microstructure and oxidation kinetics of intermetallic TiAl after Si- and Mo- ion implantation, SURF COAT, 128, 2000, pp. 418-422
Authors:
Hornauer, U
Gunzel, R
Reuther, H
Richter, E
Wieser, E
Moller, W
Schumacher, G
Dettenwanger, F
Schutze, M
Citation: U. Hornauer et al., Protection of gamma-based TiAl against high temperature oxidation using ion implantation of chlorine, SURF COAT, 125(1-3), 2000, pp. 89-93
Authors:
Schumacher, G
Lang, C
Schutze, M
Hornauer, U
Richter, E
Wieser, E
Moller, W
Citation: G. Schumacher et al., Improvement of the oxidation resistance of gamma titanium aluminides by microalloying with chlorine using ion implantation, MATER CORRO, 50(3), 1999, pp. 162-165
Authors:
Hornauer, U
Richter, E
Wieser, E
Moller, W
Schumacher, G
Lang, C
Schutze, M
Citation: U. Hornauer et al., Improvement of the high temperature oxidation resistance of Ti50Al via ion-implantation, NUCL INST B, 148(1-4), 1999, pp. 858-862