Authors:
Croffie, E
Yuan, L
Cheng, MS
Neureuther, A
Houlihan, F
Cirelli, R
Watson, P
Nalamasu, O
Gabor, A
Citation: E. Croffie et al., Modeling influence of structural changes in photoacid generators an 193 nmsingle layer resist imaging, J VAC SCI B, 18(6), 2000, pp. 3340-3344
Authors:
Cirelli, RA
Bude, J
Houlihan, F
Gabor, A
Watson, GP
Weber, GR
Klemens, FP
Sweeney, J
Mansfield, WM
Nalamasu, O
Citation: Ra. Cirelli et al., Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography, MICROEL ENG, 53(1-4), 2000, pp. 87-90