Authors:
Howell, RS
Sarcona, G
Saha, SK
Hatalis, MK
Citation: Rs. Howell et al., Preparation and stability of low temperature cobalt and nickel silicides on thin polysilicon films, J VAC SCI A, 18(1), 2000, pp. 87-93
Citation: Sk. Saha et al., Silicidation reactions with Co-Ni bilayers for low thermal budget microelectronic applications, THIN SOL FI, 347(1-2), 1999, pp. 278-283
Citation: Sk. Saha et al., Reaction mechanisms in aluminum-indium tin oxide ohmic contact metallization with Co and Ni barrier layers for active-matrix-display applications, J ELCHEM SO, 146(8), 1999, pp. 3134-3138