Authors:
Zhang, MJ
Sekiguchi, A
Okada, O
Itsuki, A
Ogi, K
Citation: Mj. Zhang et al., Chemical vapor deposition of copper thin film using a novel precursor of allyloxytrimethylsilyl hexafluoroacetylacetonate copper(I), JPN J A P 1, 40(8), 2001, pp. 4825-4828
Authors:
Uekawa, N
Ichikawa, H
Itsuki, A
Ishii, S
Kakegawa, K
Sasaki, Y
Citation: N. Uekawa et al., Preparation of oxalate by precipitation method with polyethylene glycol and formation process of the precipitate, NIP KAG KAI, (3), 2000, pp. 187-193