Authors: Urashima, K Kostov, KG Chang, JS Okayasu, Y Iwaizumi, T Yoshimura, K Kato, T

Citation: K. Urashima et al., Removal of C2F6 from a semiconductor process flue gas by a ferroelectric packed-bed barrier discharge reactor with an adsorber, IEEE IND AP, 37(5), 2001, pp. 1456-1463

Authors: Chang, JS Kostov, KG Urashima, K Yamamoto, T Okayasu, Y Kato, T Iwaizumi, T Yoshimura, K

Citation: Js. Chang et al., Removal of NF3 from semiconductor-process flue gases by tandem packed-bed plasma and adsorbent hybrid systems, IEEE IND AP, 36(5), 2000, pp. 1251-1259