Authors: JAUBERTEAU JL THOMAS L AUBRETON J JAUBERTEAU I CATHERINOT A

Citation: Jl. Jauberteau et al., HIGH REACTIVITY OF CH2 RADICAL IN AN AR-CH4 POSTDISCHARGE, Plasma chemistry and plasma processing, 18(1), 1998, pp. 137-151

Authors: ANGELELIS C FELDER E FARGES G JAUBERTEAU I NADAL M

Citation: C. Angelelis et al., MEASUREMENT OF YOUNGS MODULUS, HARDNESS ACID FLOW-STRESS OF COATINGS BY A DEPTH-SENSING INDENTATION INSTRUMENT, Annales de chimie, 23(5-6), 1998, pp. 829-846

Authors: ANGLERAUD B CAHOREAU M JAUBERTEAU I AUBRETON J CATHERINOT A

Citation: B. Angleraud et al., NITROGEN ION-BEAM-ASSISTED PULSED-LASER DEPOSITION OF BORON-NITRIDE FILMS, Journal of applied physics, 83(6), 1998, pp. 3398-3403

Authors: SOARESCARVALHO F JAUBERTEAU I THOMAS P MERCURIO JP

Citation: F. Soarescarvalho et al., BI4TI3O12 FERROELECTRIC THIN-FILMS - MORPHOLOGY AND ELECTRICAL CHARACTERISTICS, Journal de physique. III, 7(6), 1997, pp. 1221-1226

Authors: THOMAS L JAUBERTEAU JL JAUBERTEAU I AUBRETON J CATHERINOT A

Citation: L. Thomas et al., CHARACTERIZATION OF AN ARGON-HYDROGEN MICROWAVE-DISCHARGE USED AS AN ATOMIC-HYDROGEN SOURCE - EFFECT OF HYDROGEN DILUTION ON THE ATOMIC-HYDROGEN PRODUCTION, Plasma chemistry and plasma processing, 17(2), 1997, pp. 193-206

Authors: THOMAS L JAUBERTEAU I JAUBERTEAU JL CINELLI MJ AUBRETON J CATHERINOT A

Citation: L. Thomas et al., INITIAL-STAGES IN THE GROWTH OF CARBON-FILMS PRODUCED IN AN AR-CH4-H-2 MICROWAVE-DISCHARGE - COMPOSITION AND SURFACE-LAYERS MORPHOLOGY, Applied physics letters, 68(12), 1996, pp. 1634-1636