Authors: Mollard, J Tedesco, S Dal'zotto, B Jaubert, V Pain, L Fanget, G Comboroure, C Morand, Y Fayolle, M

Citation: J. Mollard et al., Hybrid deep UV-e-beam lithography for the fabrication of dual damascene structures, MICROEL ENG, 57-8, 2001, pp. 269-275