Authors: Jeon, CU Choi, JH Kim, BG Choi, SW Yoon, HS Sohn, JM

Citation: Cu. Jeon et al., A study of multiple scattering effect with 10 kV e-beam system, MICROEL ENG, 53(1-4), 2000, pp. 287-290

Authors: Choi, JH Kim, BG Jeon, CU Cho, SY Choi, SW Sohn, JM

Citation: Jh. Choi et al., A study of loading effect during electron-beam exposure and etching process in photomask fabrication, JPN J A P 1, 38(12B), 1999, pp. 6981-6984