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Results: 1-9 |
Results: 9
THEORETICAL CALCULATIONS OF SENSITIVITY OF DEPROTECTION REACTIONS FORACRYLIC POLYMERS FOR 193 NM LITHOGRAPHY II - PROTECTION GROUPS CONTAINING AN ADAMANTYL UNIT
Authors: MATSUZAWA NN TAKECHI S OHFUJI T KUHARA K MORI S ENDO M KAMON K MORISAWA T YAMAGUCHI A SASAGO M
Citation: Nn. Matsuzawa et al., THEORETICAL CALCULATIONS OF SENSITIVITY OF DEPROTECTION REACTIONS FORACRYLIC POLYMERS FOR 193 NM LITHOGRAPHY II - PROTECTION GROUPS CONTAINING AN ADAMANTYL UNIT, JPN J A P 1, 37(10), 1998, pp. 5781-5785
FABRICATION OF 0.1 MU-M PATTERNS USING AN ALTERNATING PHASE-SHIFT MASK IN ARF EXCIMER-LASER LITHOGRAPHY
Authors: NAKAZAWA K UEMATSU M ONODERA T KAMON K OGAWA T MORI S TAKAHASHI M OHFUJI T OHTSUKA H SASAGO M
Citation: K. Nakazawa et al., FABRICATION OF 0.1 MU-M PATTERNS USING AN ALTERNATING PHASE-SHIFT MASK IN ARF EXCIMER-LASER LITHOGRAPHY, JPN J A P 1, 36(12B), 1997, pp. 7488-7493
T-TOP FORMING SIMULATION USING PERCOLATION THEORY
Authors: KAMON K NAKAZAWA K YAMAGUCHI A MATSUZAWA N OHFUJI T KANZAKI K TAGAWA S
Citation: K. Kamon et al., T-TOP FORMING SIMULATION USING PERCOLATION THEORY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2610-2615
PRECISION IMPROVEMENT IN OPTICAL PROXIMITY CORRECTION BY OPTIMIZING 2ND ILLUMINATION SOURCE SHAPE
Authors: NAKAE A KAMON K HANAWA T MORIIZUMI K NAKAO S
Citation: A. Nakae et al., PRECISION IMPROVEMENT IN OPTICAL PROXIMITY CORRECTION BY OPTIMIZING 2ND ILLUMINATION SOURCE SHAPE, JPN J A P 1, 35(12B), 1996, pp. 6395-6399
EXPERIMENTAL AND SIMULATED ESTIMATION OF NEW SUPER RESOLUTION TECHNIQUE
Authors: KAMON K MATSUI Y
Citation: K. Kamon et Y. Matsui, EXPERIMENTAL AND SIMULATED ESTIMATION OF NEW SUPER RESOLUTION TECHNIQUE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4171-4174
EFFECT OF LENS ABERRATION ON RESIST PATTERN PROFILES IN EDGE-LINE PHASE-SHIFT METHOD
Authors: NAKATANI M KOJIMA Y NAKANO H KAMON K SATO K TAKANO H ISHIHARA O
Citation: M. Nakatani et al., EFFECT OF LENS ABERRATION ON RESIST PATTERN PROFILES IN EDGE-LINE PHASE-SHIFT METHOD, JPN J A P 1, 34(9A), 1995, pp. 5043-5048
PROPOSAL OF A NEXT-GENERATION SUPER RESOLUTION TECHNIQUE
Authors: KAMON K MIYAMOTO T MYOI Y WAKAMIYA W NAGATA H TANAKA M
Citation: K. Kamon et al., PROPOSAL OF A NEXT-GENERATION SUPER RESOLUTION TECHNIQUE, JPN J A P 1, 33(12B), 1994, pp. 6848-6854
LOCAL DISTORTION OF ASO4 AND PO4 MOLECULES IN KDP-FAMILY CRYSTALS
Authors: NODA Y MAEDA H TERAUCHI H KASATANI H OGURA K KAMON K UMEKI T YONEDA Y MURAKAMI S KUROIWA Y
Citation: Y. Noda et al., LOCAL DISTORTION OF ASO4 AND PO4 MOLECULES IN KDP-FAMILY CRYSTALS, JPN J A P 1, 32, 1993, pp. 740-742
TOPOGRAPHICAL MASKS - A NEW APPROACH TO INCREASE THE DOF ON TOPOGRAPHICAL SUBSTRATES
Authors: DEBEECK MO HISASUE A TOKUI A KUSUNOSE H KAMON K MORIMOTO H
Citation: Mo. Debeeck et al., TOPOGRAPHICAL MASKS - A NEW APPROACH TO INCREASE THE DOF ON TOPOGRAPHICAL SUBSTRATES, Microelectronic engineering, 21(1-4), 1993, pp. 19-24
Risultati: 1-9 |