Citation: Wt. Tsang et al., IN-SITU DRY-ETCHING OF INP USING PHOSPHORUS TRICHLORIDE AND REGROWTH INSIDE A CHEMICAL BEAM EPITAXIAL-GROWTH CHAMBER, Journal of crystal growth, 136(1-4), 1994, pp. 42-49
Authors:
CHEN YK
KAPRE R
TSANG WT
TATE A
HUMPHREY DA
FAN L
Citation: Yk. Chen et al., CARBON-DOPED INGAP GAAS/INGAP DOUBLE-HETEROJUNCTION BIPOLAR-TRANSISTORS WITH A VERY-LOW 1/F NOISE CORNER FREQUENCY OF 108 KHZ GROWN BY CHEMICAL BEAM EPITAXY/, Journal of crystal growth, 136(1-4), 1994, pp. 221-224
Citation: Wt. Tsang et al., REACTIVE CHEMICAL BEAM ETCHING OF INP INSIDE A CHEMICAL BEAM EPITAXIAL-GROWTH CHAMBER USING PHOSPHORUS TRICHLORIDE, Applied physics letters, 62(17), 1993, pp. 2084-2086