Authors:
KUBO SI
KITAMURA O
ORIHARA Y
TSUDA R
HIROSE W
NAKASONO I
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Authors:
TERAKADO S
GOTO T
OGURA M
KANEDA K
KITAMURA O
SUZUKI S
NAKAO M
TANAKA K
Citation: S. Terakado et al., NEW MICROFABRICATION TECHNIQUE AN A SUBMICROMETER SCALE BY SYNCHROTRON RADIATION-EXCITED ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2175-2178
Authors:
KITAMURA O
TERAKADO S
SUZUKI S
NAKAO M
SEKITANI T
TANAKA K
Citation: O. Kitamura et al., SYNCHROTRON-RADIATION-EXCITED ETCHING AND TOTAL ELECTRON YIELD MEASUREMENT OF SILICON AND SILICON-NITRIDE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(5), 1995, pp. 2451-2455
Citation: O. Kitamura, IMMUNOHISTOCHEMICAL INVESTIGATION OF HYPOXIC-ISCHEMIC BRAIN-DAMAGE INFORENSIC AUTOPSY CASES, International journal of legal medicine, 107(2), 1994, pp. 69-76
Citation: O. Kitamura, IMMUNOHISTOCHEMICAL INVESTIGATION OF HYPOXIC-ISCHEMIC BRAIN-DAMAGE INFORENSIC AUTOPSY CASES, International journal of legal medicine, 107(2), 1994, pp. 69-76
Authors:
KUBO S
OGATA M
KITAMURA O
TSUDA R
ORIHARA Y
HIROSE W
MATSUMOTO H
NAKASONO I
Citation: S. Kubo et al., IMMUNOHISTOLOGICAL INVESTIGATIONS OF AUTOPSIED CAROTID-BODIES AND THEIR APPLICATION TO DIAGNOSING STRANGULATION, International journal of legal medicine, 106(6), 1994, pp. 281-284
Authors:
IKEURA H
TANAKA K
SEKIGUCHI T
OBI K
KANEDA K
KITAMURA O
Citation: H. Ikeura et al., SOFT-X-RAY STIMULATED ETCHING REACTION IN THE SF6 SIO2 ADSORPTION SYSTEM STUDIED BY NEURTAL PRODUCTS DETECTION/, Applied surface science, 80, 1994, pp. 62-66
Authors:
KITAMURA O
GOTO T
TERAKADO S
SUZUKI S
SEKITANI T
TANAKA K
Citation: O. Kitamura et al., ANISOTROPIC ETCHING OF SILICON-NITRIDE AT LOW-TEMPERATURES BY SYNCHROTRON-RADIATION, Applied surface science, 80, 1994, pp. 122-128
Authors:
KITAMURA O
TERAKADO S
GOTO T
SUZUKI S
TANAKA K
Citation: O. Kitamura et al., PHOTOCHEMICAL ETCHING OF SILICON USING MONOCHROMATIC SYNCHROTRON-RADIATION, Applied physics letters, 65(2), 1994, pp. 192-194
Authors:
TERAKADO S
GOTO T
OGURA M
KANEDA K
KITAMURA O
SUZUKI S
Citation: S. Terakado et al., NEW MICROFABRICATION TECHNIQUE BY SYNCHROTRON RADIATION-EXCITED ETCHING - USE OF NONCONTACT MASK ON A SUBMICROMETER SCALE, Applied physics letters, 64(13), 1994, pp. 1659-1661
Citation: S. Terakado et al., SYNCHROTRON RADIATION-ASSISTED ETCHING OF SI IN THE PRESENCE OF REACTIVE SPECIES PRODUCED BY MICROWAVE-DISCHARGE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(5), 1993, pp. 1890-1894