Authors:
GRISHINA AD
VANNIKOV AV
KHAZOVA GO
TEODORADZE MG
KOLTSOV YI
Citation: Ad. Grishina et al., PHOTOCHEMICAL PROCESSES IN PHOTORESISTS CONTAINING ELECTRON-DONOR MOLECULES, Journal of photochemistry and photobiology. A, Chemistry, 114(2), 1998, pp. 159-162
Authors:
GRISHINA AD
VANNIKOV AV
KHAZOVA GO
TEDORADZE MG
KOLTSOV YI
Citation: Ad. Grishina et al., PHOTOCHEMICAL PROCESSES IN PHOTORESISTS BASED ON NOVOLAC CRESOL-FORMALDEHYDE RESINS CONTAINING ELECTRON-DONATING ADDITIVES, High energy chemistry, 32(3), 1998, pp. 181-184
Authors:
GRISHINA AD
KHAZOVA GO
TEDORADZE MG
VANNIKOV AV
KOLTSOV YI
Citation: Ad. Grishina et al., PHOTOCHEMICAL PROCESSES IN PHOTORESIST LA YERS BASED ON CRESOL-FORMALDEHYDE RESINS AND ORTHO-NAPHTHOQUINONEDIAZIDES IN THE PRESENCE OF DONOR ADDITIVES, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 41(5), 1996, pp. 6-14
Authors:
KHAZOVA GO
GRISHINA AD
TEDORADZE MG
VANNIKOV AV
KARASEV AL
KOLTSOV YI
Citation: Go. Khazova et al., INFRARED-SPECTRA OF EXPOSED 2-COMPONENT L AYERS CONSISTING OF 5-SULFOETHERS OF DIAZONAPHTHOQUINONE AND DONOR ADDITIVES, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 41(5), 1996, pp. 15-20
Citation: Yi. Koltsov, FUNCTIONAL-RELATIONSHIP BETWEEN SENSITOME TRIC AND KINETIC CHARACTERISTICS FOR POSITIVE PHOTORESIST-DEVELOPER SYSTEMS, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 39(4-5), 1994, pp. 1-4
Citation: Yi. Koltsov et al., THE EFFECT OF CONTENT AND PROPERTIES OF C OMPONENTS ON SENSITOMETRIC CHARACTERISTICS OF A POSITIVE PHOTORESIST-DEVELOPER SYSTEM, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 39(4-5), 1994, pp. 5-9
Citation: Vm. Tseushikov et Yi. Koltsov, KINETIC CHARACTERISTICS OF THE DEVELOPMEN T OF POSITIVE PHOTORESISTS BASED ON NAPHTHOQUINONEDIAZIDES - POLYPHOTOLYSIS, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 39(3), 1994, pp. 9-15
Citation: Mn. Voroshilova et al., SPECTRAL SENSITIVITY OF PHOTORESISTS BASE D ON 4-SULFOETHERS AND 5-SULFOETHERS OF O-DIAZONAPHTHALENONES, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 39(1), 1994, pp. 35-39
Citation: Yi. Koltsov, DISSOLUTION IN DEVELOPERS OF LAYERS OF PO SITIVE PHOTORESISTS WITH A DIFFERENT DEGREE OF CONVERSION, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 38(5), 1993, pp. 45-50
Authors:
TREUSHNIKOV VM
YANIN AM
CHEREDNIK VI
POMERANTSEVA LL
TELEPNEVA TV
OLEJNIK AV
KOLTSOV YI
Citation: Vm. Treushnikov et al., DEVELOPMENT KINETICS OF POSITIVE PHOTORES ISTS BASED ON NAPHTHOQUINONEDIAZIDES .2. SUPER HIGH-CONTRAST DEVELOPMENT, ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII, 38(4), 1993, pp. 22-29
Citation: Yi. Koltsov et Gv. Shcherbakova, INFLUENCE OF CATION CONCENTRATION ON ALKALINE DISSOLUTION AND SENSITOMETRIC CHARACTERISTICS OF POSITIVE PHOTORESIST, Journal of applied chemistry of the USSR, 65(10), 1992, pp. 1918-1922