Authors: DESCOUR MR SIMON DI SWEATT WC WARREN ME KRAVITZ SH KRENZ KD RAYCHAUDHURI AK STULEN RH

Citation: Mr. Descour et al., MICROTAGS WITH 150-NM LINE GRATINGS FABRICATED BY USE OF EXTREME-ULTRAVIOLET LITHOGRAPHY, Optics letters, 23(1), 1998, pp. 13-15

Authors: DESCOUR MR SWEATT WC KRENZ KD

Citation: Mr. Descour et al., MASS-PRODUCIBLE MICROTAGS FOR SECURITY APPLICATIONS - CALCULATED FABRICATION TOLERANCES BY VIGOROUS COUPLED-WAVE ANALYSIS, Optical engineering, 37(4), 1998, pp. 1254-1261

Authors: RAYCHAUDHURI AK KRENZ KD FIELDS CH

Citation: Ak. Raychaudhuri et al., AT-WAVELENGTH CHARACTERIZATION OF AN EXTREME-ULTRAVIOLET CAMERA FROM LOW TO MID-SPATIAL FREQUENCIES WITH A COMPACT LASER-PLASMA SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2462-2466

Authors: RAYCHAUDHURI AK KRENZ KD NISSEN RP HANEY SJ FIELDS CH SWEATT WC MACDOWELL AA

Citation: Ak. Raychaudhuri et al., INITIAL RESULTS FROM AN EXTREME-ULTRAVIOLET INTERFEROMETER OPERATING WITH A COMPACT LASER-PLASMA SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3964-3968

Authors: FIELDS CH OLDHAM WG RAYCHAUDHURI AK KRENZ KD STULEN RH

Citation: Ch. Fields et al., DIRECT AERIAL IMAGE MEASUREMENTS TO EVALUATE THE PERFORMANCE OF AN EXTREME-ULTRAVIOLET PROJECTION LITHOGRAPHY SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4000-4003

Authors: DESCOUR MR SWEATT WC RAYCHAUDHURI AK KRENZ KD WARREN ME KRAVITZ SH TICHENOR DA STULEN RH

Citation: Mr. Descour et al., MASS-PRODUCIBLE MICROSCOPIC COMPUTER-GENERATED HOLOGRAMS - MICROTAGS, Optics letters, 21(23), 1996, pp. 1951-1953