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Results: 3
MECHANICAL BRUSH SCRUBBING FOR POST-CMP CLEAN
Authors: KRUSELL WC DELARIOS JM ZHANG J
Citation: Wc. Krusell et al., MECHANICAL BRUSH SCRUBBING FOR POST-CMP CLEAN, Solid state technology, 38(6), 1995, pp. 109
POST-TUNGSTEN CMP CLEANING - ISSUES AND SOLUTIONS
Authors: MYERS TL FURY MA KRUSELL WC
Citation: Tl. Myers et al., POST-TUNGSTEN CMP CLEANING - ISSUES AND SOLUTIONS, Solid state technology, 38(10), 1995, pp. 59
TANTALUM OXIDE THIN-FILMS FOR DIELECTRIC APPLICATIONS BY LOW-PRESSURECHEMICAL-VAPOR-DEPOSITION - PHYSICAL AND ELECTRICAL-PROPERTIES
Authors: HITCHENS WR KRUSELL WC DOBKIN DM
Citation: Wr. Hitchens et al., TANTALUM OXIDE THIN-FILMS FOR DIELECTRIC APPLICATIONS BY LOW-PRESSURECHEMICAL-VAPOR-DEPOSITION - PHYSICAL AND ELECTRICAL-PROPERTIES, Journal of the Electrochemical Society, 140(9), 1993, pp. 2615-2621
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