Authors:
DEBEECK MO
HISASUE A
TOKUI A
KUSUNOSE H
KAMON K
MORIMOTO H
Citation: Mo. Debeeck et al., TOPOGRAPHICAL MASKS - A NEW APPROACH TO INCREASE THE DOF ON TOPOGRAPHICAL SUBSTRATES, Microelectronic engineering, 21(1-4), 1993, pp. 19-24
Citation: K. Miyake et al., REPULSION BETWEEN CONDUCTION ELECTRONS AS A RELEVANT PERTURBATION AGAINST THE STABILITY OF NON-FERMI-LIQUID FIXED-POINT OF MULTICHANNEL KONDO PROBLEM, Journal of the Physical Society of Japan, 62(8), 1993, pp. 2553-2556