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Citation: S. Mori et al., Sub-0.1-mu m-pattern fabrication using a 193-nm top surface imaging (TSI) process, JPN J A P 1, 37(12B), 1998, pp. 6734-6738

Authors: Mori, S Morisawa, T Matsuzawa, N Kaimoto, Y Endo, M Matsuo, T Kuhara, K Sasago, M

Citation: S. Mori et al., Reduction of line edge roughness in the top surface imaging process, J VAC SCI B, 16(6), 1998, pp. 3739-3743

Authors: Mori, S Morisawa, T Matsuzawa, N Kaimoto, Y Endo, M Matsuo, T Kuhara, K Sasago, M

Citation: S. Mori et al., Pattern collapse in the top surface imaging process after dry development, J VAC SCI B, 16(6), 1998, pp. 3744-3747