Authors:
Fischer, P
Christen, J
Zacharias, M
Schwegler, V
Kirchner, C
Kamp, M
Citation: P. Fischer et al., Scanning electroluminescence microscopy: A powerful novel characterizationtool for light emitting diodes, PHYS ST S-A, 176(1), 1999, pp. 119-123
Authors:
Daumiller, I
Schmid, P
Kohn, E
Kirchner, C
Kamp, M
Ebeling, KJ
Pond, LL
Weitzel, C
Citation: I. Daumiller et al., DC and RF characteristics of AlN/GaN doped channel heterostructure field effect transister, PHYS ST S-A, 176(1), 1999, pp. 179-181
Authors:
Schwegler, V
Schad, SS
Kirchner, C
Seyboth, M
Kamp, M
Ebeling, KJ
Kudryashov, VE
Turkin, AN
Yunovich, AE
Stempfle, U
Link, A
Limmer, W
Sauer, R
Citation: V. Schwegler et al., Ohmic heating of InGaN LEDs during operation: Determination of the junction temperature and its influence on device performance, PHYS ST S-A, 176(1), 1999, pp. 783-786
Authors:
Mayer, M
Pelzmann, A
Chung, HY
Kamp, M
Ebeling, KJ
Citation: M. Mayer et al., Reactive MBE of group III nitrides: high-quality homoepitaxial GaN and ultra-violet light-emitting diodes, J CRYST GR, 202, 1999, pp. 318-322
Authors:
Prystawko, P
Leszczynski, M
Sliwinski, A
Teisseyre, H
Suski, T
Bockowski, M
Porowski, S
Domagala, J
Kirchner, C
Pelzmann, A
Schauler, M
Kamp, M
Citation: P. Prystawko et al., Epitaxy of ternary nitrides on GaN single crystals, J CRYST GR, 199, 1999, pp. 1061-1065
Authors:
Daumiller, I
Schmid, P
Kohn, E
Kirchner, C
Kamp, M
Ebeling, KJ
Pond, LL
Weitzel, C
Citation: I. Daumiller et al., DC and RF characteristics of AlN/GaN doped channel heterostructure field effect transistor, ELECTR LETT, 35(18), 1999, pp. 1588-1590
Authors:
Kirchner, C
Schwegler, V
Eberhard, F
Kamp, M
Ebeling, KJ
Kornitzer, K
Ebner, T
Thonke, K
Sauer, R
Prystawko, P
Leszczynski, M
Grzegory, I
Porowski, S
Citation: C. Kirchner et al., Homoepitaxial growth of GaN by metalorganic vapor phase epitaxy: A benchmark for GaN technology, APPL PHYS L, 75(8), 1999, pp. 1098-1100
Authors:
Fischer, P
Christen, J
Zacharias, M
Schwegler, V
Kirchner, C
Kamp, M
Citation: P. Fischer et al., Direct imaging of the spectral emission characteristic of an InGaN/GaN-ultraviolet light-emitting diode by highly spectrally and spatially resolved electroluminescence and photoluminescence microscopy, APPL PHYS L, 75(22), 1999, pp. 3440-3442
Authors:
Schauler, M
Eberhard, F
Kirchner, C
Schwegler, V
Pelzmann, A
Kamp, M
Ebeling, KJ
Bertram, F
Riemann, T
Christen, J
Prystawko, P
Leszczynski, M
Grzegory, I
Porowski, S
Citation: M. Schauler et al., Dry etching of GaN substrates for high-quality homoepitaxy, APPL PHYS L, 74(8), 1999, pp. 1123-1125
Authors:
Kamp, M
Hofmann, J
Forchel, A
Schafer, F
Reithmaier, JP
Citation: M. Kamp et al., Low-threshold high-quantum-efficiency laterally gain-coupled InGaAs/AlGaAsdistributed feedback lasers, APPL PHYS L, 74(4), 1999, pp. 483-485