Authors: Butschke, J Ehrmann, A Hofflinger, B Irmscher, M Kasmaier, R Letzkus, F Loschner, H Mathuni, J Reuter, C Schomburg, C Springer, R

Citation: J. Butschke et al., SOI wafer flow process for stencil mask fabrication, MICROEL ENG, 46(1-4), 1999, pp. 473-476