Authors: Weber, D Hohnsdorf, F Hausmann, A Klipp, A Stavreva, Z Herrmann, J Bauch, L Junack, M Neef, H Nichterwitz, M Finsterbusch, S Liebmann, R Kallis, N Kieslich, A

Citation: D. Weber et al., Impact of substituting SiO2ILD by low k materials into AlCu RIE metallization, MICROEL REL, 41(7), 2001, pp. 1081-1083