Authors:
Piazza, F
Arnal, Y
Grambole, D
Herrmann, F
Kildemo, M
Lacoste, A
Relihan, G
Golanski, A
Citation: F. Piazza et al., Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma, THIN SOL FI, 383(1-2), 2001, pp. 196-199
Citation: M. Kildemo et O. Hunderi, Spectroscopic Fourier methods for thickness measurements of thick uniaxialwafers, with dispersive birefringence, using polarimetric techniques, J OPT A-P A, 2(5), 2000, pp. L33-L37
Citation: M. Kildemo et al., Investigation of a half-wave method for birefringence or thickness measurements of a thick, semitransparent, uniaxial, anisotropic substrate by use of spectroscopic ellipsometry, APPL OPTICS, 39(25), 2000, pp. 4649-4657
Authors:
Ossikovski, R
Kildemo, M
Stchakovsky, M
Mooney, M
Citation: R. Ossikovski et al., Anisotropic incoherent reflection model for spectroscopic ellipsometry of a thick semitransparent anisotropic substrate, APPL OPTICS, 39(13), 2000, pp. 2071-2077
Citation: M. Kildemo et al., Measurement of physical thicknesses in micromachined structures consistingof glass and c-Si, by Fourier transform infrared reflection, OPT ENG, 38(9), 1999, pp. 1542-1552