AAAAAA

   
Results: 1-15 |
Results: 15
Polymer-based multi-layer conductive electrode film for plastic LCD applications
Authors: Kim, JY Sohn, D Kim, ER
Citation: Jy. Kim et al., Polymer-based multi-layer conductive electrode film for plastic LCD applications, APPL PHYS A, 72(6), 2001, pp. 699-704
Nanopatterning of self-assembled monolayers on Si-surfaces with AFM lithography
Authors: Lee, WB Oh, Y Kim, ER Lee, H
Citation: Wb. Lee et al., Nanopatterning of self-assembled monolayers on Si-surfaces with AFM lithography, SYNTH METAL, 117(1-3), 2001, pp. 305-306
Infrared absorption spectroscopic studies of alpha,omega-diphenylpolyenyl anions with odd numbered polyene molecules
Authors: Kim, JY Kim, ER Sohn, D Sakamoto, A Tasumi, M
Citation: Jy. Kim et al., Infrared absorption spectroscopic studies of alpha,omega-diphenylpolyenyl anions with odd numbered polyene molecules, B KOR CHEM, 22(8), 2001, pp. 833-836
Electronic absorption and Raman spectroscopic studies of alpha,omega-diphenylpolyenyl anions with odd number of polyene carbons
Authors: Kim, JY Kim, ER Choo, J Sakamoto, A Tasumi, M
Citation: Jy. Kim et al., Electronic absorption and Raman spectroscopic studies of alpha,omega-diphenylpolyenyl anions with odd number of polyene carbons, B KOR CHEM, 22(8), 2001, pp. 837-841
Surface-enhanced Raman scattering of ruthenium (II) complex adsorbed on silver colloid
Authors: Jung, YM Lim, JW Kim, ER Lee, H Lee, MS
Citation: Ym. Jung et al., Surface-enhanced Raman scattering of ruthenium (II) complex adsorbed on silver colloid, B KOR CHEM, 22(3), 2001, pp. 318-320
Synthesis and characterization of soluble polythiophene derivatives containing electron-transporting moiety
Authors: Ahn, SH Czae, MZ Kim, ER Lee, H Han, SH Noh, J Hara, M
Citation: Sh. Ahn et al., Synthesis and characterization of soluble polythiophene derivatives containing electron-transporting moiety, MACROMOLEC, 34(8), 2001, pp. 2522-2527
A new positive resist based on poly(4-hydroxystyrene) for KrF excimer laser lithography
Authors: Kim, I Park, SJ Lee, SH Kim, ER Kim, KC Lee, H
Citation: I. Kim et al., A new positive resist based on poly(4-hydroxystyrene) for KrF excimer laser lithography, MOLEC CRYST, 349, 2000, pp. 179-182
Nano-patterning of polythiophene derivatives containing electron transporting moiety by using AFM lithography
Authors: Bae, E Kim, ER Lee, H
Citation: E. Bae et al., Nano-patterning of polythiophene derivatives containing electron transporting moiety by using AFM lithography, J KOR PHYS, 37(6), 2000, pp. 1026-1029
Aggregation processes of hydrophobically modified polyethylene oxide
Authors: Paeng, KW Kim, BS Kim, ER Sohn, D
Citation: Kw. Paeng et al., Aggregation processes of hydrophobically modified polyethylene oxide, B KOR CHEM, 21(6), 2000, pp. 623-627
Truncated form of importin alpha identified in breast cancer cell inhibitsnuclear import of p53
Authors: Kim, IS Kim, DH Han, SM Chin, MU Nam, HJ Cho, HP Choi, SY Song, BJ Kim, ER Bae, YS Moon, YH
Citation: Is. Kim et al., Truncated form of importin alpha identified in breast cancer cell inhibitsnuclear import of p53, J BIOL CHEM, 275(30), 2000, pp. 23139-23145
Surface coverage of self-assembled zirconium perylene phosphonate derivative films on quartz and crystal growth of zirconium perylene phosphonate derivative
Authors: Chae, HJ Kim, ER Lee, H
Citation: Hj. Chae et al., Surface coverage of self-assembled zirconium perylene phosphonate derivative films on quartz and crystal growth of zirconium perylene phosphonate derivative, MOL CRYST A, 337, 1999, pp. 149-152
New bilayer positive photoresist for 193 nm photolithography
Authors: Kim, YD Park, SJ Lee, H Kim, ER Choi, SJ Lee, SH
Citation: Yd. Kim et al., New bilayer positive photoresist for 193 nm photolithography, MOL CRYST A, 327, 1999, pp. 279-282
Chemically amplified silicon containing resist for electron beam lithography
Authors: Park, SJ Kim, KC Kim, ER Lee, H
Citation: Sj. Park et al., Chemically amplified silicon containing resist for electron beam lithography, J KOR PHYS, 35, 1999, pp. S725-S728
Synthesis of silicon-containing photoresists for ArF excimer laser lithography
Authors: Kim, YD Park, SJ Lee, H Kim, ER Choi, SJ Lee, SH
Citation: Yd. Kim et al., Synthesis of silicon-containing photoresists for ArF excimer laser lithography, JPN J A P 1, 37(12B), 1998, pp. 6869-6872
Methacrylate-based photoresist for ArF excimer laser lithography
Authors: Kim, YD Kang, YJ Lee, H Kim, ER Choi, SJ Lee, SH Jung, DW
Citation: Yd. Kim et al., Methacrylate-based photoresist for ArF excimer laser lithography, J KOR PHYS, 33, 1998, pp. S87-S90
Risultati: 1-15 |