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Results:
1-7
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Results: 7
Authors:
Klaus, JW
Ferro, SJ
George, SM
Citation: Jw. Klaus et al., Atomically controlled growth of tungsten and tungsten nitride using sequential surface reactions, APPL SURF S, 162, 2000, pp. 479-491
Authors:
Klaus, JW
Ferro, SJ
George, SM
Citation: Jw. Klaus et al., Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction, THIN SOL FI, 360(1-2), 2000, pp. 145-153
Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions
Authors:
Klaus, JW
George, SM
Citation: Jw. Klaus et Sm. George, Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions, SURF SCI, 447(1-3), 2000, pp. 81-90
Authors:
Klaus, JW
George, SM
Citation: Jw. Klaus et Sm. George, SiO2 chemical vapor deposition at room temperature using SiCl4 and H2O with an NH3 catalyst, J ELCHEM SO, 147(7), 2000, pp. 2658-2664
Authors:
Klaus, JW
Ferro, SJ
George, SM
Citation: Jw. Klaus et al., Atomic layer deposition of tungsten nitride films using sequential surfacereactions, J ELCHEM SO, 147(3), 2000, pp. 1175-1181
Authors:
Klaus, JW
Sneh, O
Ott, AW
George, SM
Citation: Jw. Klaus et al., Atomic layer deposition of SiO2 using catalyzed and uncatalyzed self-limiting surface reactions, SURF REV L, 6(3-4), 1999, pp. 435-448
Authors:
Klaus, JW
Ott, AW
Dillon, AC
George, SM
Citation: Jw. Klaus et al., Atomic layer controlled growth of Si3N4 films using sequential surface reactions, SURF SCI, 418(1), 1998, pp. L14-L19
Risultati:
1-7
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