Authors:
Chambers, JJ
Busch, BW
Schulte, WH
Gustafsson, T
Garfunkel, E
Wang, S
Maher, DM
Klein, TM
Parsons, GN
Citation: Jj. Chambers et al., Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon, APPL SURF S, 181(1-2), 2001, pp. 78-93
Authors:
Klein, TM
Anderson, TM
Chowdhury, AI
Parsons, GN
Citation: Tm. Klein et al., Hydrogenated silicon nitride thin films deposited between 50 and 250 degrees C using nitrogen/silane mixtures with helium dilution, J VAC SCI A, 17(1), 1999, pp. 108-112
Authors:
Klein, TM
Niu, D
Epling, WS
Li, W
Maher, DM
Hobbs, CC
Hegde, RI
Baumvol, IJR
Parsons, GN
Citation: Tm. Klein et al., Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100), APPL PHYS L, 75(25), 1999, pp. 4001-4003