Authors: Bublik, VT Shcherbachev, KD Komarnitskaya, EA Parkhomenko, YN Vygovskaya, EA Evgen'ev, SB

Citation: Vt. Bublik et al., Formation of radiation-induced point defects in silicon doped thin films upon ion implantation and activating annealing, CRYSTALLO R, 44(6), 1999, pp. 1035-1041